| abstract |
The invention provides a silicon compound represented by the following general formula (A-1) or (A-2), n n n n n n n n n n n n wherein, R represents a hydrocarbon group having 1 to 6 carbon atoms, R 1 and R 2 represent an acid labile group, R 3 represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms, k represents an integer of 1 or 2, m represents an integer of 0, 1, or 2, and n represents an integer of 0 or 1. n n n n n There can be provided a resist underlayer film that can be applied not only to a resist pattern formed by a hydrophilic organic compound obtained in negative development but also to a resist pattern composed of a hydrophobic compound obtained in conventional positive development. |