Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7fd911de6f4961b4d8fc43308f86377d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c754156d9ab873a2efe5a3990dbf627 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cb5a8dbefeb9ee45a1ec6ff8d4e39910 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66969 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78603 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
filingDate |
2012-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8b335d4ff8a48239d23f00b535a10d9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d0ae3e81bc1c9949b1ff9fad96a41bc |
publicationDate |
2013-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2013270546-A1 |
titleOfInvention |
Active device and fabricating method thereof |
abstract |
An active device and a fabricating method thereof are provided. The active device includes a buffer layer, a channel, a gate, a gate insulation layer, a source and a drain. The buffer layer is disposed on a substrate and has a positioning region. A thickness of a portion of the buffer layer in the positioning region is greater than a thickness of a portion of the buffer layer outside the positioning region. The channel is disposed on the buffer layer and in the positioning region. The gate is disposed above the channel. The gate insulation layer is disposed between the channel and the gate. The source and the drain are disposed above the channel and electrically connected to the channel. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014239291-A1 |
priorityDate |
2012-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |