| abstract |
The present invention is related to a method for depositing a coating on a substrate ( 2 ) by a flame-assisted chemical vapour deposition technique, wherein the substrate is exposed to a flame produced by a burner ( 1 ), while a flow of precursor elements is added to said flame, and wherein the substrate is subjected to a relative movement with respect to said burner wherein the flame is dragged out along a reaction zone ( 3 ) situated behind the burner, and wherein the relative speed of the substrate with respect to the flame is higher than 30 m/min. |