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publicationDate 2013-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013248382-A1
titleOfInvention Selective Masking by Photolithography (SMP) for Making Electrochemical Measurements
abstract A method for isolating microstructural regions or features on a surface for electrochemical experimentation comprising polishing a metal sample, coating the metal sample with a photoresist, selecting a region of interest of the metal sample, exposing the region of interest with light energy, developing the exposed photoresist and creating a developed region.
priorityDate 2011-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 26.