| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33dafb5bbc2ec47ebcb7becbbe60f704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d9302fc7ca31704efef52d1c3a50e2d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_39d1e0351f0c5a70699af116b598e99c |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D497-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78e0aec554f537333621fe7fff8fef98
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_baef610ba9f55f242c3c235fbad3e6c8 |
| publicationDate |
2013-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013230802-A1 |
| titleOfInvention |
Acrylamide derivative, polymer compound and photoresist composition |
| abstract |
To provide an acrylamide derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylamide derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides an acrylamide derivative represented by the following formula (1): n n n n n n n n n n n n wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents a C1 to C10 alkylene group or a C3 to C10 cycloalkylene group; R 2 represents a cyclic group having 3 to 20 ring-forming atoms and represented by the following formula (2): n n n n n n n n n n n n n n n n wherein X represents an oxygen atom or >N—R 3 ; R 3 represents a hydrogen atom or a C1 to C5 alkyl group; Y represents >C═O or >S(═O) n ; and n is an integer of 0 to 2. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9557647-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017277037-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10012903-B2 |
| priorityDate |
2010-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |