http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013224636-A1

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filingDate 2013-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28d3c69e0c5bb801e2a4a751b6918adc
publicationDate 2013-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013224636-A1
titleOfInvention Mask for near-field lithography and fabrication the same
abstract Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having nanometer scale features may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107850833-A
priorityDate 2010-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 49.