| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02301
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02312 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2013-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_289788145b429c403698ad6f750349b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e8bf6e3f0e3ae6c46034cacafab8113 |
| publicationDate |
2013-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013183834-A1 |
| titleOfInvention |
Methods and apparatus for processing a substrate |
| abstract |
Methods and apparatus for processing a substrate are provided. In some embodiments, a method of processing a substrate disposed in a process chamber includes performing a process on a substrate disposed in a process chamber having a substrate support ring configured to support the substrate and a reflector plate disposed proximate a back side of the substrate; providing a first gas comprising one of an oxygen containing gas or a nitrogen containing gas to a back side of the substrate via one or more through holes disposed in the reflector plate while performing the process on the substrate; and maintaining the process chamber at a first pressure proximate a top surface of the substrate and at a second pressure proximate the bottom surface of the substrate, wherein the first pressure is greater than the second pressure sufficiently to prevent dislodgement of the substrate from the substrate support ring during processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107658243-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11441222-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10900142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9881788-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106298581-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015073185-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105088177-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10851457-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013196482-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023140938-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10330535-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9759615-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110783233-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9431285-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015340225-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11725283-B2 |
| priorityDate |
2012-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |