http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013177760-A1

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publicationDate 2013-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013177760-A1
titleOfInvention Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films
abstract A method of forming a thin barrier layer film of a mixed metal oxide, such as a mixture of aluminum, titanium, and oxygen (AlTiO), comprises sequential exposure of a substrate having a surface temperature less than 100° C. to a halide precursor, an oxygen plasma, and a metalorganic precursor. Barrier films formed by the method exhibit improved water vapor transmission rate (WVTR) over single metal oxide films and nanolaminates of two metal oxides having a similar overall thickness.
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