Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3ed1b4c530f5620c3090eae508b4411b http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8ef5c11ac1e0bb024de8ec5c3ca97354 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-08 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-69 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J183-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J5-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-04 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J5-06 |
filingDate |
2012-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_420713467f608b42ea6681d6e096eafd |
publicationDate |
2013-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2013174980-A1 |
titleOfInvention |
High strength bonding and coating mixture and method |
abstract |
A method of using a high-strength bonding and coating mixture is disclosed. The mixture includes a silicon compound having a polycarbosilane backbone and a powder having a plurality of individual powder grains. Each of the powder grains has a diameter substantially between 0.05 micrometers and 50 micrometers. The mixture is applied to one or more work pieces and the work piece(s) is (are) heated in either an inert or reduction environment to a temperature sufficient to decompose the silicon compound into gaseous atoms and radicals of silicon and carbon. |
priorityDate |
2009-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |