http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013171835-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e796ff0a1cef1e85635b2cfe49ce6db5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e18ed31cb76e83205618c3c24bbad408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc6220b93fae4be14ada49e4ecc1860b http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4666fd83ab310cb6def7d03091a22aa2 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0206 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 |
| filingDate | 2011-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91dac081bf5f658a57466fad3e67dffe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96bc7bf351f1e7e0219e71856adf0793 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f4a8a347cdb40474f18338eed938ded |
| publicationDate | 2013-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2013171835-A1 |
| titleOfInvention | Composition for water-repellent treatment of surface, and method for water-repellent treatment of surface of semiconductor substrate using same |
| abstract | The purpose of the present invention to provide: a composition which can be used for water-repellent treating of the entire surface of a semiconductor substrate having a pattern formed by laminating a Si-containing insulating layer and a metal layer, at one time; and a method for water-repellent treatment of the semiconductor substrate surface using the composition. n The present invention relates to: (1) a composition for water-repellent treatment of a semiconductor substrate surface comprising a) at least one kind of a compound selected from the group consisting of a long-chain alkyl tertiary amine and a long-chain alkyl ammonium salt, b) a base or an acid generating agent, having a condensed ring structure or forming a condensed ring structure by generating a base or an acid and c) a polar organic solvent, and (2) a method for water-repellent treatment of the semiconductor substrate surface having the pattern formed by laminating the Si-containing insulating layer and the metal layer, using the composition. |
| priorityDate | 2010-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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