| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_083fe924190fa14a7ba5698eb9ef3546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2e26af083b0b9a9c9b4d17907e9410d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6eaded0512d72126fb2b255c9a2cb775
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc905cbef116a1ec61d12125af9427f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e93e62bc78ec5db1bb5e185536890116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc3d3fcd7d8626300311d503ab133124 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02366
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022483
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02168 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2012-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2262b79909e9437b50cfba9711305ba6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17db539daf8c76ca72970aaf6cb7b504
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_776a59b494beb8078235ca086b774a45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8bba6c447c962241b85e2dc2716898c |
| publicationDate |
2013-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013167920-A1 |
| titleOfInvention |
Conductive substrate and fabricating method thereof, and solar cell |
| abstract |
A fabricating method of a conductive substrate including the following steps is provided. A substrate is provided. A barrier layer having a first roughened surface is formed on the substrate by an atmospheric pressure plasma process, wherein the surface roughness (Ra) of the first roughened surface formed by the atmospheric pressure plasma process is between 10 nanometers (nm) and 100 nm. A first electrode layer is formed on the first roughened surface of the barrier layer by a vacuum sputter process, wherein a second roughened surface with the surface roughness (Ra) between 10 nm and 100 nm is formed on a surface of the first electrode layer. Furthermore, a photoelectric conversion layer is formed on the second roughened surface of the first electrode layer. A second electrode layer is formed on the photoelectric conversion layer. A solar cell and a conductive substrate are also provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015027521-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9716207-B2 |
| priorityDate |
2011-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |