| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3abe78a84eaa88ff96c412c0b5c2f28b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_15dd848cf33e759b39db4f785cf045fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_622b84db904cd6b4bc97e079a813247a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1824
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-182 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2011-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07906d887f155373a864b9d2fdbdf6ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d2a2a6caec05205944687f827768cc1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1de887221af5fc731a530aa30370dfd4 |
| publicationDate |
2013-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013143403-A1 |
| titleOfInvention |
Texture-etchant composition for crystalline silicon wafer and method for texture-etching (1) |
| abstract |
Disclosed herein is an etching composition for texturing a crystalline silicon wafer, comprising, based on a total amount of the composition: (A) 0.1 to 20 wt % of an alkaline compound; (B) 0.1 to 50 wt % of a cyclic compound having a boiling point of 100° C. or more; (C) 0.00001 to 10 wt % of a silica-containing compound; and (D) residual water. The etching composition can maximize the absorbance of light of the surface of a crystalline silicon wafer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9944890-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9784072-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016244700-A1 |
| priorityDate |
2010-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |