| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bdb19e1d1f1020838f7f20061c150f94 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02697
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2013-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81463972658ac74367226ea4a68e06f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4df4da5bba5428c2dcd4b164e36798bb |
| publicationDate |
2013-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013143402-A1 |
| titleOfInvention |
Method of forming Cu thin film |
| abstract |
The disclosure provides a method for forming a dense Cu thin film by atomic layer deposition, comprising the following steps of: (A) providing an additive gas; (B) choosing a copper-containing metal-organic complex as a precursor; (C) using a carrier gas to introduce the additive gas into the precursor cell mixing with the precursor; (D) pre-depositing the precursor on the surface of the substrate with a TaN x thin film at a first temperature; (E) removing the excess copper-containing metal-organic complex and the excess additive gas; (F) introducing a reducing gas into the reactive system and annealing at a second temperature to reduce the Cu 2 O thin film to form a Cu thin film on the substrate and (G) removing the excess reducing gas from the reactive system. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9988715-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110668392-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109686497-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10324703-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115874165-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022141354-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113166934-A |
| priorityDate |
2010-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |