Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3abe78a84eaa88ff96c412c0b5c2f28b http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_15dd848cf33e759b39db4f785cf045fa http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_622b84db904cd6b4bc97e079a813247a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
filingDate |
2011-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1de887221af5fc731a530aa30370dfd4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d2a2a6caec05205944687f827768cc1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07906d887f155373a864b9d2fdbdf6ec |
publicationDate |
2013-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2013137278-A1 |
titleOfInvention |
Texture-etchant composition for crystalline silicon wafer and method for texture-etching (2) |
abstract |
Disclosed herein is an etching composition for texturing a crystalline silicon wafer, comprising, based on a total amount of the composition: (A) 0.1 to 20 wt % of an alkaline compound; (B) 0.1 to 50 wt % of a cyclic compound having a boiling point of 100° C. or more; (C) 0.000001 to 10 wt % of a fluorine-based surfactant; and (D) residual water. The etching composition can maximize the absorbance of light of the surface of a crystalline silicon wafer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9305792-B2 |
priorityDate |
2010-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |