| abstract |
The present invention provides a gas barrier film having high barrier properties, folding/bending resistance and smoothness and excellent cutting suitability, and also provides an organic photoelectric conversion element equipped with the gas barrier film. The gas barrier film is characterized by having a gas barrier layer unit ( 5 ) on a side face of at least one surface of a base material ( 2 ), wherein the gas barrier layer unit ( 5 ) comprises a first barrier layer ( 3 ) formed by a chemical vapor deposition method and a second barrier layer ( 4 ) formed by applying a silicon compound onto the first barrier layer ( 3 ) to form a coating film and modifying the coating film, and wherein the second barrier layer ( 4 ) has an unmodified region ( 4 B) on a side facing the base material and a modified region ( 4 A) on a side facing the front layer of the film. |