| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B44C1-227 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22 |
| filingDate |
2012-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75092ab9ca62e5f7e8ac776daa41f7f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b00979ec075408d1a0faafcbafd3ece7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5925beebfad29fd9bbcdfe669cdc0285 |
| publicationDate |
2013-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013098870-A1 |
| titleOfInvention |
Method for forming pattern |
| abstract |
A method for forming a pattern includes providing a composition to form a resist underlayer film on a surface of a substrate to be processed. The composition contains a calixarene based compound having a group represented by a following formula (i) bound to at least a part of an aromatic ring or at least a part of a heteroaromatic ring of the calixarene based compound. The resist underlayer film on the surface of the substrate is treated with heat or an acid. A resist pattern is formed on a surface of the resist underlayer film. The resist underlayer film and the substrate are etched using the resist pattern as a mask to form the pattern on the substrate. The dry-etched resist underlayer film is removed from the substrate with a basic solution. n —O—R 1 (i) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015185613-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020528951-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9696626-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106793537-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7273023-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106852005-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9400429-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10466590-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9828457-B2 |
| priorityDate |
2011-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |