| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_70fcdb2ee46c4fa7412a739c7f4446cb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9c2032188233fc7c18c25694874b37d0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f2b45e5919a2432d32f3327b55a39095 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 |
| filingDate |
2011-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f53cdfe2d5e36c7b2b9c44bfbaeafd75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a7cbc9819db9d73ee88bd8b92b2e01c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2615d3bdf4f1355e59c0f27dadb42ce |
| publicationDate |
2013-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013084707-A1 |
| titleOfInvention |
Dry cleaning method for recovering etch process condition |
| abstract |
A method of patterning a substrate is described. The method includes establishing a reference etch process condition for a plasma processing system. The method further includes transferring a mask pattern formed in a mask layer to one or more layers on a substrate using at least one plasma etching process in the plasma processing system to form a feature pattern in the one or more layers and, following the transferring, performing a multi-step dry cleaning process to substantially recover the reference etch condition. Furthermore, the multi-step dry cleaning process includes performing a first dry cleaning process step using plasma formed from a first dry clean process composition containing an oxygen-containing gas, and performing a second dry cleaning process step using plasma formed from a second dry clean process composition containing a halogen-containing gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022076921-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9564343-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10573495-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102038174-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022262622-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11742183-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10643858-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9881807-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019108978-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150097416-A |
| priorityDate |
2011-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |