http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013052371-A1

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filingDate 2011-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e32a16d9ea6d6bf302ccf7d129a98967
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publicationDate 2013-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013052371-A1
titleOfInvention Movable liner assembly for a deposition zone in a cvd reactor
abstract A chemical vapor deposition (CVD) reactor comprises a deposition zone, a substrate carrier and a liner assembly. The deposition zone is constructed so as to have a positive pressure reactant gases fixed showerhead introducing reactant gas supporting thin film CVD deposition. The substrate carrier movably supports a substrate and the liner assembly within the deposition zone and is heated so as to be subjected to a CVD process. The liner assembly partly encloses selected portions of the deposition zone, particularly portions of the substrate carrier and thereby enclose a hot zone surrounding a substrate to be processed so as to retain heat in that zone but allows gas flow radially outwardly toward walls of a surrounding cold-wall reactor with exhaust ports surrounding the deposition zone that exhaust spent reactant gases. The liner assembly is a sink for solid reaction byproducts while gaseous reaction byproducts are pumped out at the exhaust ports. The liner assembly is linearly movable away from the fixed showerhead.
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priorityDate 2011-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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