| abstract |
A sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided: n n n n n n n n n n wherein X represents an electron donor group; R 1 and R 2 each independently represent an alkyl group or the like; R 4 to R 6 each independently represent an alkyl group, or the like; R 3 represents a cyclic alkenediyl group or the like; and −A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness. |