| abstract |
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), n n n n n n n n n n n n wherein R 1 , A 1 , A 13 , A 14 , X 12 , Q 1 , Q 2 , L 1 , ring W, R f1 and R f2 , n and Z + are defined in the specification. |