Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00906ba5ef509df43e26d0031e31b7cf http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e0086dda23873a77b16d3455e96a5910 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_097405822d505467fd50f7100022cd56 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2011-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87c508a6c395d1073e7b7ed11b1efb45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97a7bb8f8dc74ec4fd6cae445e629206 |
publicationDate |
2013-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2013017375-A1 |
titleOfInvention |
Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern |
abstract |
A developing solution is disclosed with which it is possible to develop a photoresist disposed on a substrate including a conductive polymer. Also disclosed is a method for forming a resist pattern using the developing solution. The developing solution contains one or more acids and/or salts thereof, the acids being selected from inorganic acids, amino acids having an isoelectric point less than 7, and carboxylic acids having two or more carboxy groups. Use of this developing solution hence inhibits the phenomenon in which a substrate including a conductive polymer suffers an increase in surface resistivity due to a developing solution, and makes it possible to obtain a fine resist pattern. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10115563-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I620996-B |
priorityDate |
2010-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |