| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b85fdfcf6139861fca8b9464a4935754
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063e4ce32e4d4a81303f20df9d856686
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a0553475b0a3e907d304be24ea297b71 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 |
| filingDate |
2011-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c6b3c5f4ff9659ac2764c8fd066c9f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d1763e87eb950dd6b8c9c73e645a54c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51b2df5f3b69dad0be4d4568c9a0afd5 |
| publicationDate |
2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012329370-A1 |
| titleOfInvention |
Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate |
| abstract |
The polishing liquid according to the embodiment comprises abrasive grains, an additive and water, wherein the abrasive grains satisfy either or both of the following conditions (a) and (b).n (a) Producing absorbance of at least 1.50 for light with a wavelength of 400 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %, and also producing light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %. (b) Producing absorbance of at least 1.000 for light with a wavelength of 290 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 0.0065 mass %, and also producing light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015129796-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10703947-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10549399-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10557058-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10825687-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10557059-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112680111-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10196542-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015096238-A1 |
| priorityDate |
2010-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |