| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4f2af9feb3f787cfe73f442e6d2adfbf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e79a2906cf0142f31c269cd78820cd88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d56b30f532fdc1a2276c04b7ac88f37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8a16e2fa556744225f7c2bba36087e7f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5b3175cd74455b9626d0c2b9013bf6a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e5ab4c4ad3a4f6f14241b56386311fa |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2012-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38efba642bd99168d72339e84f379dec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f69e1f491c50d4a9e5638056f59b2b28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9c8c78373e8537193fc76ce5c733331
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7a5f60f884b5148abeec6556b484975
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28a2b727a261432d09ad3cf4592654d1 |
| publicationDate |
2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012328856-A1 |
| titleOfInvention |
Photosensitive resin composition and circuit formation substrate using the same |
| abstract |
A photosensitive resin composition for an interlayer insulating film or a protective film of a substrate for circuit formation, which includes a polymer (a) having a structural unit shown by the formula (A) and a compound (b) which generates a radical when irradiated with active rays and has a structure shown by the following formula (B). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10450417-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018215874-A1 |
| priorityDate |
2009-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |