| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2ec534d8ed448bb98a8065cf476fcb4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_78e1e5e022a46bae1a0d8d033fa2e4a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9cdbc8b85d226460bafb09bdc4d1a8fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdbbbde2b923d32c3906e39660732e37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
| filingDate |
2011-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4234751dc500c7513e6f841f093588e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1381a0ab8feaaa61af87e3687317e683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3ede69694e0b70f447a209a3acb4d3d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_631000d8a87034bce9f32df13362e626 |
| publicationDate |
2012-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012295038-A1 |
| titleOfInvention |
Method and apparatus for using solution based precursors for atomic layer deposition |
| abstract |
A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016090652-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10985360-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021262907-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021096786-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11588142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10253414-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020270750-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11139460-B2 |
| priorityDate |
2005-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |