| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d1f2ed31f89146a9c92fab721ea5beb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ba761e43f3b71e3f19779f6cdb7849ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8152cd5b5af71c8034a21e527502cf74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c3d4da3c8544280d0afe31c6db0094f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-125 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 |
| filingDate |
2012-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81e11065fc7bb4a29b28bccf9bef0f38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12f9e93ca9ae512bdf3b873cdc3385c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_032c2e817289625712c2a61a7ff4a9c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50a4a654881bfd68c5557b72a6eecef0 |
| publicationDate |
2012-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012291668-A1 |
| titleOfInvention |
Aromatic vinyl ether based reverse-tone step and flash imprint lithography |
| abstract |
A molding composition and a method of forming a pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9980392-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017042038-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11501969-B2 |
| priorityDate |
2006-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |