| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e132f43886b13f9902a9c69cd03f4ac1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8ff42e432135f0380b50af4de8cf06f5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7bc584a721040e485486d4a9ff728739 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 |
| filingDate |
2012-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d9c7f7f4a5e03060de1e4f1b2356d2a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f07b4d6be89b6e9075dd5653d7280c5b |
| publicationDate |
2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012287393-A1 |
| titleOfInvention |
Positive photosensitive resin composition and method for forming patterns by using the same |
| abstract |
A positive photosensitive resin composition and a method for forming patterns by using the same are disclosed. The photosensitive resin composition comprises a novolac resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B), a dye (C) and a solvent (D). The novolac resin (A) includes a high-ortho novolac resin (A-1) that has ortho-ortho methylene bonding to all methylene bonding in a ratio of 18% to 25%, thereby exhibiting excellent temporal stability and forming patterns with high resolution. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019002962-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020098242-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11561469-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I644173-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7340328-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012328799-A1 |
| priorityDate |
2011-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |