Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f142ec43440009c3bcf4cb6678709e7c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_14cc9419da14d3f19e6cf65398aef30a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a1b9c4e47de2c8bdc59adc45c429a36f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bfc8965a187263e52efe5b20d82b2152 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-249953 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-10 |
filingDate |
2012-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72470bcee2360404ea80046c20907932 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35d6872f8f8495bc28a28a69311bc8b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4da738ac21c3c48cd70f49e8ddc2bb3b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44917bf954f30a4691d10cc238b6b070 |
publicationDate |
2012-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2012276346-A1 |
titleOfInvention |
Self-assembly of block copolymers on topographically patterned polymeric substrates |
abstract |
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11226555-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160019938-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014201396-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10025285-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102050628-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10739673-B2 |
priorityDate |
2008-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |