| abstract |
The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): n n n n n n n n n n wherein R 1 , X 1 , R 2 , u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2. |