| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cdd94f212dc7aef02fc1dcf28fa9b4fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36b8f98a07f87d6426eefaa8b41d3226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f236f0d95cca1ac8097784638cc29dae |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-7244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-549 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K30-88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B9-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06 |
| filingDate |
2010-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_519998fdda40a627f165e98e2a0e5dd8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_508ad302c84a06e956fdc686c8648031 |
| publicationDate |
2012-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012241889-A1 |
| titleOfInvention |
Gas barrier film, method of manufacturing gas barrier film, and organic photoelectric conversion element |
| abstract |
Disclosed is a gas barrier film which has both high gas barrier performance and high cracking (bending) resistance. Specifically disclosed is a gas barrier film which comprises, on a substrate in the following order, at least one silanol-containing layer and at least one gas barrier layer that contains silicon atoms and hydrogen atoms. The gas barrier film is characterized in that the relative SiOH ion strength in the central part of the silanol-containing layer in the film thickness direction as detected by time-of-flight secondary ion mass spectrometry (Tof-SIMS) is 0.02-1.0 when the relative Si ion strength is taken as 1. Also disclosed is an organic photoelectric conversion element which comprises the gas barrier film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014234602-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022200898-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9512334-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9577211-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9332593-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10109387-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017189232-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012015181-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012228648-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010059494-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017110677-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014174528-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9112173-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014199544-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10654070-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013092239-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016327719-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10509440-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10879479-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9818962-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9771654-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016300637-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9684339-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9457376-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11737292-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015047694-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10571619-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9698370-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023143289-A1 |
| priorityDate |
2009-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |