| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f09deb893f1814f18dea70172e0b0a18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e36cd213df736a0f4e9e27c588820527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b9d0431643a8821a088efdecd07080e8 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-06 |
| filingDate |
2012-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee39cbcd24d13f5c49c7db89f765b013
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb8d50d57bb07f5265f4bf5a95f2f149 |
| publicationDate |
2012-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012213946-A1 |
| titleOfInvention |
Doping Control by ALD Surface Functionalization |
| abstract |
Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A funtionalization species inhibits the deposition reaction. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11094457-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014338600-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019390341-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108233649-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10256126-B2 |
| priorityDate |
2011-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |