| abstract |
A method for chemical vapor deposition of a polymer film onto a substrate ( 6 ), includes the following two separate, consecutive steps:—a step for the photon activation of the gas phase wherein photon activation energy ( 42, 43 ) is provided to at least one gaseous polymer precursor that is present in a mainly gaseous composition, and—a chemical vapor deposition step wherein the activated gaseous polymer precursor, from the photon activation step, is deposited onto a substrate ( 6 ) so as to form a polymer film on the substrate, the total gas phase pressure ranging from 10 2 to 10 5 Pa. A device ( 1 ) for using such a method is also described. |