| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ca5ff9cbed92537c43cf29f6bb376052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_782e96e15f86d01b3aba154db9c81b6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_af9d787c1f9f1cbfc41a9fa059468389
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1f4f50ecfc36fc87e70289ed1f300678
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9eb9df557afcf7e069ee48fe0af50110 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-62 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0338
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-06 |
| filingDate |
2010-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_476bd9a1c2d22b43d232f240c849946e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1cd6d9ce535eb42135d6d46e1a3b747
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_517a1d53c64bd8e846a0740fb9bbdef5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb2d4c0d35dc0b0d743aae300561e77f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99f8bb9c1c668901e628dfe76c078ccb |
| publicationDate |
2012-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012160801-A1 |
| titleOfInvention |
Superfine Pattern Mask, Method for Production Thereof, and Method Employing the Same for forming Superfine Pattern |
| abstract |
There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity. n The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11434390-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11739220-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3048146-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102048680-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160057450-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3082153-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11203528-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105793963-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015160555-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10126651-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020277190-A1 |
| priorityDate |
2010-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |