http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012156625-A1

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filingDate 2010-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012156625-A1
titleOfInvention Nano-fabrication method
abstract Disclosed herein is a nano-fabrication method, which includes the step of: (a) forming an inorganic resist layer on a substrate; (b) forming an organic photoresist layer on the inorganic resist layer; (c) irradiating both the organic photoresist layer and the inorganic resist layer with a laser beam to form a first exposed region of the inorganic resist layer and a second exposed region of the organic photoresist layer; (d) removing the inorganic resist layer of the first exposed region and the organic photoresist layer of the second exposed region to form a patterned inorganic resist layer and a patterned organic photoresist layer; and (e) removing the patterned organic photoresist layer from the patterned inorganic resist layer.
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