| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_64485c025e1464b7f04c9a64d73134db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_49f5a779eff1897763fbeb8273e8ab99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b1c4221d1b4164cca3f6163fe3414dec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4e28ce9654419f402f5a317cb54b418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7179855c338c79e0ae1ce7ce6c875e6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de85789149a8fc3265249e63b89c18ff |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2011-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cefe716a69e58ad74618b9df52c51950
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed47916270ff8b82983033e49a2f9ec6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f727b7da9461296c3bb1a711488aaf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_566a43e9d5f3c945d6b25925bef1fa16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fff2f9bca454acfaa9d58f61e8a7dd9a |
| publicationDate |
2012-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012114903-A1 |
| titleOfInvention |
Method for forming a microstructure |
| abstract |
A method for forming a microstructure includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable compound that has a photocurable functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask using a first light source so that the photocurable layer is cured at first regions which are exposed; (d) removing the patterned mask; and (e) illuminating the photocurable layer using a second light source to cure second regions of the photocurable layer which have not been cured. The first and second regions have different surface heights and provide a surface roughness for the microstructure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014363771-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107304335-A |
| priorityDate |
2010-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |