| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1d29f7ac2c7f9be9f7dae1a83bbb5c92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01f692d40ca04f2cd66997cfecb98f53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7204e93ebfd9740918cca60cb287fc63 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0015 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C31-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-12 |
| filingDate |
2010-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c15d60b071ab47d107d1c384237a7392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f20cc96dbd7bfecd48d0896d63962c5a |
| publicationDate |
2012-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012107749-A1 |
| titleOfInvention |
Resist pattern forming method and developer |
| abstract |
There are provided a method of forming a resist pattern, comprising the steps of forming a resist film containing a specific calixarene derivative on a substrate; forming a pattern latent image by selectively exposing the resist film to a high-energy beam; and developing the latent image by removing parts not exposed to the high-energy beam of the resist film with a developer containing at least one fluorine-containing solvent selected form the group consisting of a fluorine-containing alkyl ether and a fluorine-containing alcohol, and the fluorine-containing solvent as a resist developer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8936900-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3410209-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8924733-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8765356-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011307708-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015010858-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9417523-B2 |
| priorityDate |
2009-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |