Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d13c039b4f110275bf46ad05a786a71f |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-00 |
filingDate |
2011-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1179e2a9e1dd93c9ac61cdd1cb195e6f |
publicationDate |
2012-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2012103936-A1 |
titleOfInvention |
Methods for reducing photoresist interference when monitoring a target layer in a plasma process |
abstract |
A method and apparatus for monitoring a target layer in a plasma process having a photoresist layer is provided. The method is useful in removing noise associated with the photoresist layer, and is particularly useful when signals associated with the target layer is weak, such as when detecting an endpoint for a photomask etching process. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8956809-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10043641-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018082827-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I744382-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102007512-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190045387-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014022077-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109791900-A |
priorityDate |
2010-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |