| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ecc8287acee5a111b6a70c5e38544ce7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_78095cf7d9469f7101f3a5da2067c060
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b63256a9094d37e0c389bac549e3bb13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f9c2e1af948ed88b1d501e78d99fe780 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e67a9550c2a7006463e92fdc3fe9469b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1945f8ab9f424f8148ddef1b205bf57c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88aece8227686f783ad89a040293ea61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ececc4226090b5b39b3d4edd7017a628 |
| publicationDate |
2012-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012070782-A1 |
| titleOfInvention |
Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same |
| abstract |
A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102014114176-B4 |
| priorityDate |
2009-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |