| abstract |
Disclosed is an Al alloy reflective film which has a higher reflectance than that of pure Al films when produced by sputtering, excels in alkali resistance, acid resistance, and moisture resistance, and therefore less suffers from the reduction in reflectance even when a protective coating is not applied. Specifically disclosed is an Al alloy reflective film which contains at least one element selected from Sc, Y, La, Gd, Tb, and Lu in a total amount of from 0.4 to 2.5 atomic percent, with the remainder being Al and inevitable impurities. The Al alloy reflective film has a film surface roughness of 4 nm or less as measured with an atomic force microscope. Also disclosed are an automotive lighting device and an illumination device each provided with the reflective film. Further disclosed is an Al alloy sputtering target for use in the formation of the reflective film. |