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publicationDate 2012-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012052682-A1
titleOfInvention Polishing slurry and method of manufacturing semiconductor device using the same
abstract A polishing slurry for polishing an aluminum film includes an abrasive agent, an oxidizing agent, an anti-corrosion agent, and a removal rate reducing agent that is an anionic compound exhibiting a negative charge in the slurry. The polishing slurry can be used in a method of manufacturing a semiconductor device.
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