http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012024449-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f9ad497fbc83d21afada537cfa68de7f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3998c16ace04d65cde938b3ff6f9e2f4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2be2ad1569fab934b3b9c01084c69d38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-10
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B37-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
filingDate 2010-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50999afc6e295bf1d8e8852e36eeb5ea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cd2f97d08ad8225366f82e2df8959a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0216b21e0812310882f4b272a85785d7
publicationDate 2012-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012024449-A1
titleOfInvention Parasitic plasma prevention in plasma processing chambers
abstract Parasitic plasma in voids in a component of a plasma processing chamber can be eliminated by covering electrically conductive surfaces in an interior of the voids with a sleeve. The voids can be gas holes, lift pin holes, helium passages, conduits and/or plenums in chamber components such as an upper electrode and a substrate support.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9793128-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10815562-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11127567-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11773479-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11371142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I710472-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10497598-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9793096-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015004793-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8869742-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016336210-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I659853-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11078568-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3387162-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10665429-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11008653-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10808315-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012034786-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017172705-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9184028-B2
priorityDate 2010-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005105243-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5886863-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009243236-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE36810-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5800618-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5959409-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4963713-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009169726-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002135969-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007119370-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23987
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452498775
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559503
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577374
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID159374
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6336883
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID90455
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426099666
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717

Total number of triples: 74.