http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012021961-A1

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filingDate 2010-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6fb350a6bb05a075ee6c649713f485c
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publicationDate 2012-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012021961-A1
titleOfInvention Composition for post chemical-mechanical polishing cleaning
abstract The present invention relates to a composition for post chemical-mechanical polishing (CMP) cleaning. The composition is alkaline, which can remove azole-type corrosion inhibitors on the wafer surface after CMP. This composition can effectively remove azole compounds, increase wettability of the Cu surface, and significantly improve the defect removal after CMP.
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priorityDate 2009-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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