| abstract |
The present invention relates to a process for the preparation of a layered silicate containing at least silicon and oxygen, comprising (1) providing a mixture containing silica and/or at least one silica precursor, water, at least one tetraalkylammonium compound selected from the group consisting of diethyldimethylammonium compound, a triethylmethylammonium compound, and a mixture of a diethyldimethylammonium and a triethylmethylammonium compound, and at least one base, and optionally at least one suitable seeding material; and (2) heating of the mixture obtained according to (1) under autogenous pressure (hydrothermal conditions) to a temperature in the range of from to 120 to 160° C. for a period in the range of from 5 to 10 days to give a suspension containing the layered silicate. |