http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011319584-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1b420c0c87c2ad7efa4d63760fd228c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cc3161b703dc232ba08264dbd59ae0e2 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C67-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-28 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F120-10 |
| filingDate | 2010-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86b5fa2829e71346e82fec4d412dfe53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8aa9e6500af15453f12b1d3996bba34e |
| publicationDate | 2011-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2011319584-A1 |
| titleOfInvention | Adamantane derivative, method for producing same, polymer using same as starting material, and resin composition |
| abstract | Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, F 2 excimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like. n n n n n n n n n n In the formula, R 1 through R 3 , which may be the same or different, each represent a hydrogen atom, an alkyl group having a carbon number of 1 to 3, or a halogen-containing alkyl group; R 4 through R 8 , which may be the same or different, each represent an alkyl group having a carbon number of 1 to 3 or a halogen-containing alkyl group; X, which may be the same or different, represents a hydrogen atom, an alkyl group having a carbon number of 1 to 3, or a alkoxy group having a carbon number of 1 to 3; and n represents 14. |
| priorityDate | 2009-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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