http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011290184-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_264ae94f610e2c156f3965906396a088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_83f0c9bba75f2aa2a82c16ea543933d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7ec1623ad31167e4c9575f20cf3eb9df http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f542482342c82755cce711977eb334fc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0641 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4418 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2009-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47c3f4c1413fbe77e88a1e0d6d4daf0c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f25d2f4a849d2f05bf4046acfcf5b643 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cebe73499976db1eb6ca9368f32adf7d |
| publicationDate | 2011-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2011290184-A1 |
| titleOfInvention | Poly silicon deposition device |
| abstract | Provided is a poly silicon deposition device, which includes an electrode part, a silicon core rod part, a silicon core rod heating part, a gas supply pipe, and a gas injection part. The electrode part includes a first electrode and a second electrode which are disposed in a bottom of a reactor including a gas inlet for introducing source gas, a gas outlet for discharging gas, and a heating material inlet for introducing a heating material, and are spaced a predetermined distance from each other. The silicon core rod part receives electric current from the first electrode and transmits the electric current to the second electrode to generate heat. The silicon core rod heating part is spaced a predetermined distance from the silicon core rod part and surrounds the silicon core rod part and includes a heater receiving the heating material introduced through the heating material inlet of the reactor. The gas supply pipe is disposed between the heater and the silicon core rod part to supply the source gas introduced through the gas inlet of the reactor, to the silicon core rod part. The gas injection part includes a plurality of nozzles disposed in a surface of the gas supply pipe to discharge the source gas to the silicon core rod part. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10208381-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/AT-13092-U1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016106337-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10774443-B2 |
| priorityDate | 2008-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.