http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011284163-A1

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filingDate 2011-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2011-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2011284163-A1
titleOfInvention Plasma processing apparatus
abstract A plasma processing apparatus includes a chamber for processing a substrate. A plasma generator is provided to generate plasma within the chamber. A window is provided in a sidewall of the chamber, and the window transmits light from the plasma within the chamber. A photocatalytic layer is provided on an inner surface of the window such that the photocatalytic layer is activated as a result of exposure to light from the plasma to decompose a residual product on the inner surface of the window.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016141148-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016181073-A1
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priorityDate 2010-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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