| abstract |
Provided are a photoresist composition having superior adhesion to an etch target film, a method of forming a pattern by using the photoresist composition, and a method of manufacturing a thin-film transistor (TFT) substrate. The photoresist composition includes an alkali-soluble resin; a photosensitive compound; a solvent; and 0.01 to 0.1 parts by weight of a compound represented by Formula 1: n n n n n n n n n n wherein R is one of hydrogen, an alkyl having 1 to 10 carbon atoms, a cycloalkyl having 4 to 8 carbon atoms, and a phenyl group. |