| abstract |
The present invention is an organoruthenium compound for use in production of a ruthenium or ruthenium compound thin film by chemical vapor deposition, including ruthenium and an arene group and norbornadiene both coordinated to the ruthenium and represented by the following formula. The present invention is an organoruthenium compound for use in chemical vapor deposition which does not require the coexistence of oxygen during the thin film formation, and moreover, is liquid at ordinary temperature, thereby having good handleability and recyclability. n n n n n n n n n n wherein the substituents, R 1 to R 6 , of the arene group are each hydrogen or an alkyl group, and the total number of carbons of R 1 to R 6 (R 1 +R 2 +R 3 +R 4 +R 5 +R 6 ) is 6 or less. |