| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_22ac87e1e6a74d1ca3c612fa3645b8eb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24521 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67086 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F15C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-30 |
| filingDate |
2011-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af00591015374f68c618b852b27a7ec1 |
| publicationDate |
2011-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011262710-A1 |
| titleOfInvention |
Rheological Fluids for Particle Removal |
| abstract |
Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9441753-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012273053-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8973613-B2 |
| priorityDate |
2008-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |