| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2011-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0b9fdcd02896bed15c330df43dce53d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af2df146e3c8c403a827b3e958b36cf8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a |
| publicationDate |
2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011244399-A1 |
| titleOfInvention |
Method of forming resist pattern and negative tone-development resist composition |
| abstract |
A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure of the resist film, and patterning the resist film by a negative tone development using a developing solution containing an organic solvent, wherein the base component (A) includes a resin component (A1) containing a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibits increased hydrophilicity by the action of an acid and a structural unit (a0) derived from an acrylate ester containing an —SO 2 — containing cyclic group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9140983-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244357-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013252171-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8795947-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8795948-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013022911-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9134617-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014015599-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9040224-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013252180-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013004740-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8841060-B2 |
| priorityDate |
2010-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |