http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011244377-A1

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filingDate 2011-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaa26d7284c6169b88584ed1bfc96db3
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publicationDate 2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2011244377-A1
titleOfInvention Fluorine-passivated reticles for use in lithography and methods for fabricating the same
abstract Fluorine-passivated reticles for use in lithography and methods for fabricating and using such reticles are provided. According to one embodiment, a method for performing photolithography comprises placing a fluorine-passivated reticle between an illumination source and a target semiconductor wafer and causing electromagnetic radiation to pass from the illumination source through the fluorine-passivated reticle to the target semiconductor wafer. In another embodiment, a fluorine-passivated reticle comprises a substrate and a patterned fluorine-passivated absorber material layer overlying the substrate. According to another embodiment, a method for fabricating a reticle for use in photolithography comprises providing a substrate and forming a fluorine-passivated absorber material layer overlying the substrate.
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Total number of triples: 26.